2-Phosphonobutane-1,2,4-tricarboxylic Acid PBTCA CAS 37971-36-1

Tree Chem manufactures PBTCA CAS 37971-36-1 for customers requiring reliable phosphonate-based chelating agents with strong calcium tolerance and long-term stability. Its robust chelation capacity toward Ca²⁺ and Fe ions makes it particularly effective in preventing scale deposition in circulating cooling systems, RO pretreatment, and high-hardness industrial water conditions.

Supplied as a colorless to pale-yellow transparent liquid, PBTCA demonstrates excellent thermal stability, oxidation resistance, and compatibility with various polymeric dispersants and phosphonate blends. It performs reliably in high-temperature systems and cleaning formulations that require enhanced metal ion control. For cooperation or technical support, please contact info@cntreechem.com.

Specification

Basic Information

Technical Specification

Applications

Water Treatment Industry

• Diethylenetriaminepenta(methylene phosphonic acid) (DTPMP) is primarily used as a high-performance scale inhibitor and corrosion inhibitor in industrial water treatment, especially in circulating cooling-water and boiler systems. In recirculating cooling water, it chelates Ca²⁺, Mg²⁺, Ba²⁺, Sr²⁺ and Fe ions and shows a strong threshold effect, so even at 2–10 mg/L (or 10–30 mg/L when used alone) it suppresses CaCO₃, CaSO₄ and BaSO₄ scale while maintaining performance in alkaline conditions around pH 8.5–9.5 and at temperatures above 200 °C. By distorting crystal lattices and dispersing fine particles it prevents formation of hard, adherent deposits on heat-exchange surfaces.
• DTPMP is widely used in blended cooling-water programs, where it is combined with zinc salts to obtain synergistic corrosion inhibition and with polyacrylates (PAA) or other polycarboxylates to enhance dispersion. Typical compositions such as 15 mg/L DTPMP·Na₂ plus 5 mg/L PAA use phosphonate chelation and polymer dispersion together to keep scaling salts in suspension, while DTPMP/HPMA blends at 1:3 mass ratio and 5–15 mg/L total dosage are widely applied in low-pressure boiler internal treatment to prevent phosphate and silica scales and maintain high thermal efficiency. In high-pressure boilers, DTPMP is matched with polymer dispersants to tolerate higher cycles of concentration and to control mixed phosphate–silicate deposits.
• In oilfield water-injection systems, DTPMP is an important inhibitor for mixed carbonate and sulfate scaling in high-salinity, high-temperature environments. Typical dosages of 10–50 mg/L in injection water are adjusted to hardness and saturation indices to prevent BaSO₄, SrSO₄ and CaCO₃ deposition that would otherwise plug tubing and formation pore throats. For high-mineralization waters, DTPMP·Na₇ at 15–25 mg/L with 5–8 mg/L PAA and 3–5 mg/L sodium citrate forms a composite inhibitor capable of suppressing scaling after mixing with formation water. In systems rich in barium, 20–40 mg/L DTPMP is one of the few chemistries that can effectively control BaSO₄ scale under 60–120 °C and elevated pressure.
• DTPMP is also used as a membrane antiscalant in reverse-osmosis systems, where 2–5 mg/L in brackish water or 5–10 mg/L in seawater feeds (pH 6–9) suppress CaCO₃, CaSO₄, BaSO₄, SrSO₄ and even silica scaling on RO membranes, maintaining flux and reducing cleaning frequency. In municipal and industrial wastewater treatment, its strong chelation enables removal of heavy-metal ions such as Cu²⁺, Zn²⁺, Pb²⁺ and Cd²⁺ by forming stable complexes that can be precipitated or retained in specialized treatment stages; under pH 8–10 conditions, heavy-metal removal rates can exceed 95%, supporting compliance with discharge standards and detoxification of contaminated streams.

Daily Chemical and Personal-Care Industry

• In the daily chemical sector, DTPMP is valued as a multi-functional chelating agent, stabilizer and performance booster in modern detergents. In liquid laundry detergents, it is typically added at 0.1–0.5% by weight alongside anionic and nonionic surfactants, phosphate or zeolite builders and solvents such as propylene glycol; its role is to complex Ca²⁺ and Mg²⁺, soften water, maintain surfactant efficiency and protect sensitive ingredients from metal-catalyzed degradation during storage. A representative laundry-liquid formula with 15% LAS, 10% AEO-9, 5–10% builder and 0.1–0.3% DTPMP uses the phosphonate as the primary chelant.
• In dishwashing liquids, DTPMP is used at around 0.1% by weight to replace or complement EDTA-2Na in classic formulations comprising LAS, AES, 6501, AEO-9, preservative, caustic and salt. Here it controls hardness, prevents metal-catalyzed oxidation that would discolor the product and enhances anti-spotting performance on glass and tableware. Concentrated dishwashing liquids with 35–40% actives raise DTPMP dosage to 0.2–0.3% to match higher surfactant levels while maintaining clarity and stability over shelf life.
• In cosmetics and personal-care products, DTPMP is used at 0.05–0.2% as a low-dose stabilizing chelant. In face creams and serums it complexes trace iron, copper and other metals that accelerate oxidation of oils, vitamins and fragrances, thereby preserving color, odor and viscosity and extending product shelf life. Typical moisturizing-cream formulas use about 0.1% DTPMP in the water phase with glycerin, hyaluronic acid and preservatives. In shampoos and shower gels, 0.1–0.3% DTPMP prevents hardness ions from interacting with surfactants and dyes, supporting foam quality, color stability and the performance of conditioning agents, and in hair-dye systems it stabilizes peroxide developers and prevents metal-induced off-tones.

Pharmaceutical and Radiopharmaceutical Applications

• In pharmaceuticals, DTPMP and its closely related phosphonate systems are important ligands in radiopharmaceuticals for diagnosis and therapy of bone metastases. Complexes such as ¹⁷⁷Lu-EDTMP and ¹⁵³Sm-EDTMP are prepared using EDTMP as the chelating framework, but the industry research on DTPMP describes similar coordination behavior and highlights the broader family of aminopolyphosphonates for bone targeting. Typical ¹⁷⁷Lu-EDTMP preparation uses 25 mg of ligand with 100 μL of ¹⁷⁷LuCl₃ solution at pH 8.0 and 100 °C for 30 minutes, achieving labeling yields above 95%; the resulting complexes selectively accumulate in bone and deliver β-radiation to metastatic lesions.
• In the context of chelation therapy, the report discusses the derivative chelant DTPA (diethylenetriaminepentaacetic acid), whose calcium salt Ca-DTPA is used to treat internal contamination by actinides such as plutonium, americium and curium. This illustrates the medical relevance of the diethylenetriamine backbone shared with DTPMP and underscores the importance of multidentate ligands in binding and promoting renal excretion of toxic metals and radionuclides. DTPMP-type structures are also explored as components of disinfectant systems, where quaternary-ammonium derivatives exhibit broad-spectrum antimicrobial activity for medical-device disinfection by disrupting microbial membranes.
• In more advanced drug-delivery research, DTPMP’s multidentate phosphonic acid groups are investigated as part of drug-carrier frameworks. Their ability to form stable complexes with metal ions and to interact with charged surfaces is leveraged to immobilize active molecules, adjust release profiles and potentially target mineralized tissues; in some slow-release formulations, a phosphonate-based carrier prolongs drug residence time at the site of action and enhances bioavailability compared with simple solutions.

Pulp and Paper Industry

• In pulp and paper manufacturing, DTPMP plays multiple roles as a chelating agent, stabilizer and dispersant across pulping, bleaching and papermaking. During chemical pulping, 0.1–0.5% on oven-dry pulp is used to chelate transition metals such as Fe, Mn and Cu, which otherwise catalyze carbohydrate degradation and reduce pulp yield and strength; DTPMP also helps disperse fibers, improving uniformity of the pulp slurry. In mechanical pulping, it protects fibers from metal-catalyzed oxidative damage, improving brightness and long-term stability.
• In hydrogen-peroxide bleaching stages, DTPMP is one of the most important chelants for stabilizing H₂O₂. Typical use levels of 0.15–0.50% on absolutely dry pulp at 40–60 °C, 10–15% consistency and 45–75 minutes retention remove catalytic metal ions, slow uncontrolled peroxide decomposition and allow higher brightness at lower peroxide dosages. The report cites an example using 0.3% DTPMP at pH 7 and 70 °C on eucalyptus CTMP, demonstrating improved bleaching performance and fiber protection. In oxygen delignification, low-level DTPMP (around 0.1–0.3%) acts as a stabilizer, preventing excessive carbohydrate oxidation while enhancing delignification efficiency.
• In the papermachine section, DTPMP is used as a water-quality stabilizer and dispersant in white-water loops and paper-machine circuits. By binding Ca²⁺ and Mg²⁺ and other ions, it helps prevent deposits on wires, felts and rolls and reduces formation of spots and pinholes in the sheet. In sizing and coating operations, DTPMP contributes to stabilizing size and coating formulations, preventing precipitation of components caused by hardness ions and maintaining dispersion of pigments and fillers. In wastewater treatment from pulp and paper mills, it works as a coagulant aid and metal-ion chelator, helping to remove residual metals and improve floc formation when used with coagulants and flocculants.

Textile Printing and Dyeing Industry

• In the textile industry, DTPMP is widely used as a chelating agent, peroxide-bleach stabilizer, dyeing auxiliary and component of scouring/pretreatment agents. In pre-chelation and water conditioning, 0.5–2 g/L DTPMP at 40–60 °C and pH 4–6 is applied before dyeing to remove Fe³⁺, Cu²⁺, Mn²⁺ and hardness ions from process water, preventing these metals from interacting with dyes to cause shade changes, color spots and uneven dyeing. After treatment and thorough rinsing, fabrics enter dye baths under more controlled metal conditions, improving reproducibility.
• As a hydrogen-peroxide bleaching stabilizer, DTPMP is dosed at 10–30 ppm in baths containing 3–10 g/L H₂O₂ at pH 9–11 and 90–100 °C. By chelating catalytic metal ions, it moderates peroxide decomposition, achieves higher whiteness, reduces fiber damage and minimizes silicone or silica deposits that can arise from other stabilizer systems. The report notes that DTPMP-stabilized peroxide bleaching offers good whiteness, soft handle and minimal fabric damage.
• DTPMP is also integrated into dyeing auxiliaries to improve dye solubility and dispersion and to prevent dye aggregation or precipitation. In reactive dyeing, it binds Ca²⁺ and Mg²⁺ to avoid formation of insoluble dye salts and thus increases fixation and color fastness. In vat and sulfur dyeing, it reduces interference from metal ions in reduction and oxidation stages, while in acid dyeing it prevents unwanted dye–metal complexes that would shift shade or reduce brilliance. As a component of scouring and refining systems, typical recipes combine 2–4 g/L of a refining agent, 1–2 g/L DTPMP and 15–30 g/L NaOH at 80–95 °C for 60–120 minutes, removing oils and waxes and chelating metals to protect fibers during high-alkali treatment.

Metal Processing and Surface Treatment

• In metal processing, DTPMP is used in electroplating, metal cleaning, antirust formulations and surface treatment processes. In cyanide-free electroplating, it serves as a key complexing agent for copper and pseudo-gold baths: non-cyanide copper electroplating formulas typically contain 20–25 g/L copper sulfate and 50–200 g/L DTPMP or related complexant, along with tartaric or similar organic acids, operating at pH 8–12 and 20–40 °C to deposit bright, fine-grained copper coatings without cyanide. For cyanide-free imitation-gold plating, DTPMP is used with copper sulfate, zinc sulfate, sodium stannate, boric acid, citric acid and KOH to produce golden decorative deposits with reduced environmental impact.
• As a component of metal-cleaning agents, DTPMP is typically formulated at 0.5–2% with 5–10% organic acid (such as citric acid), 3–8% surfactants and suitable corrosion inhibitors, used at 50–60 °C for 6–8 hours to remove rust, scale and deposits from internal surfaces of boilers, heat exchangers and other equipment. Its strong chelation dissolves metal oxides and scale while its corrosion-inhibiting character protects the metal matrix. In combination with sulfamic or other acids at a 1:3–1:5 ratio, DTPMP improves cleaning efficiency and reduces base-metal loss.
• In water-borne antirust formulations, DTPMP acts as one of several synergistic corrosion inhibitors. A typical long-term anti-rust concentrate contains deionized water, phosphoric acid, sodium molybdate, sodium silicate, a film-forming polymer, nonionic surfactant, hydroxyethyl cellulose, benzotriazole and 0.5–1% DTPMP; the phosphonate adsorbs on metal surfaces and contributes to formation of a dense protective film that blocks oxygen and moisture, allowing long-term corrosion protection. In phosphating and passivation, DTPMP improves control over film growth and enhances corrosion resistance and adhesion of the final conversion coating.

Electronics and Semiconductor Industry

• In electronics, high-purity DTPMP is used in semiconductor manufacturing, CMP slurries, display panels and PCB processing. In semiconductor CMP for ceria-based polishing slurries, typical formulations contain 2–4 wt% nano-CeO₂, 0.2–0.5 wt% DTPMP as chelating agent, 0.2–0.5 wt% dispersant and 0.2–0.5 wt% oxidant in water; DTPMP helps control pH, chelates metal ions and stabilizes abrasive dispersion, thereby improving planarization quality and reducing defect density. In tungsten CMP, DTPMP can be used as an auxiliary ligand in slurries that combine silica abrasives, acids, oxidant and organophosphonate dispersants to enhance removal rate yet protect tungsten surfaces from excessive attack.
• For wafer and chip cleaning, ultra-pure electronic-grade DTPMP (metal ion content ≤1 ppb and purity ≥99.999%) is formulated at 0.1–1% in high-resistivity deionized water to remove trace metals and contaminants from semiconductor surfaces without damaging patterned structures. These cleaning solutions are tailored to advanced node requirements, where very low metallic contamination is critical to yield and device reliability. In display-panel manufacturing (LCD, OLED and related technologies), DTPMP-containing cleaning and etching aids are used to reduce burr formation during fine etching of copper foils, improve surface smoothness and gloss and ensure uniformity of fine conductive lines.
• In PCB production, DTPMP is used both in cleaning and in plating processes. As a cleaning additive, 0.2–0.5% DTPMP with 0.5–1% surfactants and pH regulators forms a neutral, environmentally friendly cleaner that removes flux residues and metal particles without etching copper patterns. In electroless and electrolytic copper systems, it can act as part of the complexing and stabilizing package to maintain solution stability and deposit quality during formation of through-holes and fine-line interconnects.

Other Industrial Fields (Energy, Food, Building Materials and Agriculture)

• Beyond its main markets, DTPMP has diverse applications in new-energy systems, food processing, building materials, petrochemicals and agriculture. In solar-energy applications, low-level DTPMP is used in cleaning agents for photovoltaic panels, where 0.5–1% in water with mild surfactants removes deposits without damaging glass or coatings, maintaining optical efficiency. In lithium-battery systems, 0.01–0.1% DTPMP is explored as an electrolyte additive to stabilize metal ions and reduce side reactions, enhancing battery performance and safety. DTPMP-based formulations also appear in fuel-cell systems as part of catalyst-support or cooling-water treatments to control scaling and corrosion.
• In the food industry, carefully controlled, low-dose DTPMP is used as a chelating and preservative aid to prevent metal-induced oxidation and discoloration. In beverages it helps prevent turbidity and precipitates caused by metal ions, keeping products clear; in dairy it limits Ca/Mg precipitation, stabilizing formulations; in meat products, small additions with ascorbate and phosphate blends reduce oxidative discoloration and extend shelf life. Building-materials applications include concrete admixtures (0.01–0.05% of cement) and gypsum-board additives, where DTPMP chelates metal ions, improves microstructure, enhances strength and crack resistance and supports higher durability.
• In petrochemicals, DTPMP is used as a component in oilfield chemicals beyond water-injection inhibitors, including refinery additives, lubricant additives and fuel stabilizers. In lubricants it improves anti-oxidation and anti-wear properties, while in fuels it suppresses metal-catalyzed oxidation to improve storage stability. In agriculture, DTPMP is applied as a micronutrient chelating carrier in water-soluble fertilizers, where chelates of Fe, Zn, Mn and Cu prepared with DTPMP maintain high solubility and plant uptake. It also appears in pesticide formulations as an emulsifier and stabilizer and in soil-improvement products to chelate heavy metals in contaminated soils, reducing bioavailability and plant uptake.

Storage & Handling

• Store in sealed plastic drums.
• Keep in cool, dry, and ventilated storage areas.
• Avoid contact with oxidizing agents and metal salts.
• Use corrosion-resistant handling equipment.
• Ensure grounding during transfer to prevent static buildup.

Usage Notice

• Wear appropriate protective gear during use.
• Avoid direct contact with skin and eyes.
• Confirm compatibility before blending with other additives.
• Follow local regulations for chemical handling and transportation.
• Industrial circulating cooling-water inhibitor: 2–10 mg/L DTPMP in alkaline cooling-water systems at pH 8.5–9.5 controls CaCO₃ and CaSO₄ scaling in circuits with calcium hardness up to about 500 mg/L and alkalinity up to 300 mg/L.
• Cooling-water corrosion and scale inhibitor blend: 10–20 mg/L DTPMP with 1–5 mg/L Zn²⁺ in tower water (total 11–25 mg/L) combines zinc-driven cathodic polarization with phosphonate chelation to protect carbon-steel equipment.
• DTPMP–PAA composite cooling-water formulation: 15 mg/L DTPMP·Na₂ with 5 mg/L PAA (3:1 ratio) provides synergistic chelation and dispersion to suppress deposition of CaCO₃ and CaSO₄ in circulation systems.
• Low-pressure boiler internal-treatment formula: DTPMP and HPMA at a 1:3 mass ratio and 5–15 mg/L total dosage are used at boiler water pH 9.0–11.0 to prevent Ca₃(PO₄)₂ and silica-based scales and maintain heat-transfer efficiency.
• High-pressure boiler treatment blend: 5–15 mg/L DTPMP with 3–10 mg/L polymer dispersant at pH 9.5–11.0 supports high cycles of concentration while controlling phosphate and silicate scaling.
• Oilfield injection-water treatment: 10–50 mg/L DTPMP is injected into 40–90 °C waters at pH 6.5–8.5 to prevent BaSO₄, SrSO₄ and CaCO₃ deposition in injection pipelines and reservoirs.
• High-mineralization oilfield water inhibitor: 15–25 mg/L of 30% DTPMP·Na₇ with 5–8 mg/L PAA (10%) and 3–5 mg/L sodium citrate keeps mixed sulfate scales from forming when injection water mixes with formation water.
• BaSO₄-rich oilfield scale-control program: 20–40 mg/L DTPMP is applied at 60–120 °C to provide targeted inhibition of barium sulfate scale in high-barium reservoirs.
• Brackish-water RO antiscalant: 2–5 mg/L DTPMP in feeds at pH 6.0–7.5 suppresses CaSO₄ and CaCO₃ scaling on membranes and maintains permeate flux.
• Seawater RO antiscalant: 5–10 mg/L DTPMP in seawater feeds at pH 6.5–8.0 inhibits CaCO₃, CaSO₄, BaSO₄ and SrSO₄ deposition on RO membranes in desalination plants.
• Chemical cleaning solution for cooling-water systems: 1000–2000 mg/L DTPMP with 5–10% organic acid, 0.5–1% surfactant at pH 2.0–4.0 and 50–60 °C for 6–12 hours dissolves internal scale and rust from circulation equipment.
• Standard liquid laundry-detergent formula: 15% LAS, 10% AEO-9, 3% 6501, 5–10% builders, 3–5% propylene glycol, 0.1–0.3% DTPMP, 0.1–0.5% fragrance and water as balance deliver high detergency with controlled hardness and storage stability.
• Economic dishwashing-liquid formula: 10.5 parts LAS, 8 parts AES, 2 parts 6501, 0.08 parts preservative, 1.3 parts NaOH, 5–10 parts AEO-9, 0.1 parts DTPMP, 1 part NaCl and water to 100 parts give good foaming and cleaning with metal-ion control.
• Moisturizing face-cream formula: an oil phase of 5% jojoba oil, 8% shea butter and 5% squalane with a water phase of 65% deionized water, 5% glycerin, 0.1% DTPMP, 0.2% hyaluronic acid, emulsifier and preservatives yields a stable cream with extended shelf life.
• Shampoo formulation: 12% AES, 5% cocamidopropyl betaine, 2% pearlizing agent, 3% glycerin, 0.1–0.2% DTPMP, 0.5% fragrance and water as balance provide cleansing, foam and color stability in hard water.
• Laundry-detergent concentrate: 25–30% surfactants, 15–20% builders, 1–2% anti-redeposition agent, 0.3–0.5% DTPMP and water as balance deliver high cleaning power and scale control in compact liquid products.
• Peroxide-bleaching stage for pulp: 0.15–0.50% DTPMP on oven-dry pulp with 2–5% H₂O₂ at 60–80 °C and 10–15% consistency for 2–4 hours improves brightness and protects pulp strength.
• Oxygen-delignification stabilizer: 0.1–0.3% DTPMP with 3–5% NaOH at 90–110 °C and 0.5–0.8 MPa oxygen pressure limits carbohydrate degradation while enhancing delignification.
• Textile pre-chelation bath: 0.5–2 g/L DTPMP at 40–60 °C, pH 4–6 and 30–60 minutes treatment removes Fe, Cu and Mn ions prior to dyeing, preventing shade variation and spots.
• Textile peroxide-bleaching liquor: 10–30 ppm DTPMP with 3–10 g/L H₂O₂ and NaOH to pH 9–11 at 90–100 °C for 60–90 minutes stabilizes peroxide and protects cotton fibers.
• Scouring/ refining bath: 2–4 g/L refining agent BLJ-9102 with 1–2 g/L DTPMP and 15–30 g/L NaOH at 80–95 °C for 60–120 minutes removes oils and metal contaminants from fabrics before dyeing.
• Cyanide-free copper-plating bath: 20–25 g/L copper sulfate, 50–200 g/L DTPMP complexant, 30–50 g/L potassium sodium tartrate, brighteners and pH 8–12 at 20–40 °C produce bright, fine-grained copper coatings without cyanide.
• Cyanide-free imitation-gold plating solution: 20–25 g/L copper sulfate, 30–40 g/L zinc sulfate, 0–8 g/L sodium stannate, 20–30 g/L boric acid, 80–100 g/L citric acid, suitable DTPMP and 80–110 g/L KOH at pH 10–12 and 25–35 °C yield decorative gold-colored deposits.
• Metal-cleaning agent: 5–10% organic acid, 0.5–2% DTPMP, 3–8% surfactants, 0.2–0.5% corrosion inhibitor and water as balance are used at 50–60 °C for 6–8 hours to clean rust and scale from metal equipment.
• Water-borne rust inhibitor: 65% deionized water, 8% phosphoric acid, 6% sodium molybdate, 5% sodium silicate, 10% polyvinyl butyral, 3% fatty-alcohol ethoxylate, 1.2% hydroxyethyl cellulose, 1.3% benzotriazole and 0.5–1% DTPMP form a long-term, environmentally friendly metal-protection fluid.
• Semiconductor CMP slurry: 2–4 wt% nano-ceria, 0.2–0.5 wt% DTPMP, 0.2–0.5 wt% dispersant, 0.2–0.5 wt% oxidant and water to balance at pH 3–6 deliver controlled removal rates and low defect counts in wafer planarization.
• Ultra-pure electronic-cleaning solution: 0.1–1% electronic-grade DTPMP with metal-ion content below 1 ppb in 18 MΩ·cm deionized water is used to remove trace metallic contamination from advanced semiconductor wafers.
• Water-soluble fertilizer with chelated micronutrients: a 20-20-20 N-P-K base plus 0.05% each of DTPMP-chelated Fe, Zn, Mn and Cu and 0.1% borax yields a stable solution with high micronutrient availability for crops.

Packaging

• 25 kg plastic drum
• 250 kg plastic drum
• Customized packaging available upon request