N-Methyl-2-pyrrolidone NMP N-Methylpyrrolidone CAS 872-50-4

Tree Chem N-Methyl-2-pyrrolidone CAS 872-50-4 is a premium polar aprotic solvent with strong dissolving power and high chemical stability. It is widely used in the electronics industry for chip fabrication, lithium-ion batteries, and high-purity chemical synthesis.

Produced under stringent quality control, Tree Chem Electronic Grade NMP meets the purity and conductivity requirements of the semiconductor and battery sectors. Each batch is tested using advanced analytical methods to ensure consistent performance and ultra-low moisture. For inquiries or cooperation, please contact info@cntreechem.com.

Specification

Basic Information

Technical Specification

Applications

Lithium Battery Industry

• N-Methyl-2-Pyrrolidone (NMP) is a critical solvent in the lithium-ion battery industry, primarily used in cathode slurry preparation. It dissolves polyvinylidene fluoride (PVDF) binders to form uniform slurries that enhance adhesion between active materials such as LiCoO₂, LiFePO₄, and the aluminum current collector. NMP’s high boiling point and strong polarity allow for excellent dispersion and stability during high-temperature coating and drying.
• As the new energy industry continues to grow, NMP demand has surged dramatically. In 2024, China accounted for more than 95% of the global NMP consumption, driven by booming electric vehicle and energy storage production. The compound is also pivotal in high-solid-content slurry technology, where its optimized viscosity control enables higher energy density and improved manufacturing efficiency. Recovered NMP, purified through vacuum distillation, achieves 99.9% purity, ensuring sustainability and cost efficiency.

Electronics and Semiconductor Industry

• In the semiconductor field, NMP serves as a high-performance photoresist stripper and precision cleaning solvent. It effectively removes resist residues, flux, and organic contaminants from wafers, printed circuit boards (PCB), and liquid crystal display (LCD) panels. Its compatibility with metals, ceramics, and silicon substrates makes it a preferred cleaning medium for advanced fabrication nodes such as 5 nm and 3 nm.
• NMP is also used in electronic-grade chemical blends, such as EKC cleaning solutions, where it acts as a non-proton polar solvent to dissolve deep polymer residues without corroding sensitive components. Additionally, it functions as a carrier solvent in the production of polyimide films, epoxy resins, and magnetic materials essential for semiconductors and displays.

Coatings and Inks

• In coatings and ink applications, NMP functions as a high-boiling co-solvent that improves film formation, adhesion, and leveling. It dissolves acrylic, polyurethane, and epoxy resins, enhancing the flexibility and gloss of coatings. In waterborne formulations, NMP acts as a film-forming assistant that regulates drying rates and minimizes surface defects.
• In the ink industry, it serves as a co-solvent in UV-curable and gravure printing inks, optimizing flow and pigment dispersion. NMP’s compatibility with multiple resin systems allows its use in automotive coatings, ship paints, and high-end printing applications that demand high chemical stability and environmental resistance.

Pharmaceutical and Agrochemical Industries

• NMP is widely used as a reaction medium, extraction solvent, and intermediate in pharmaceutical synthesis. It participates in peptide synthesis, antibiotic production, and drug delivery formulations. Its low toxicity and excellent solubility make it suitable for transdermal and controlled-release systems.
• In the agrochemical sector, NMP acts as both a synthetic solvent and formulation aid for herbicides, insecticides, and fungicides. It improves solubility and uniform distribution of active ingredients in suspension and emulsifiable concentrates. Its chemical inertness ensures compatibility with active substances and formulation additives, contributing to stable, efficient pesticide products.

Polymer and Fine Chemical Industry

• NMP is an essential solvent in polymer synthesis, particularly in the production of polyimides, polyphenylene sulfide (PPS), aramids, and polyurethane resins. It provides excellent solvation for polymer chains, allowing uniform reactions and smooth film formation. In fine chemicals, NMP facilitates high-purity synthesis of heterocyclic compounds and intermediates used in advanced materials and specialty chemicals.
• It also acts as a polymerization solvent for engineering plastics and fibers, enabling production of high-strength, heat-resistant materials. In coatings and adhesives, NMP ensures homogeneous polymer dispersion, improving performance and processing stability.

Gas Separation and Extraction

• NMP’s strong selectivity for aromatic and unsaturated hydrocarbons allows its use in the separation of benzene, toluene, and xylene (BTX) from reformate, as well as purification of acetylene and butadiene. In gas treatment, it serves as a desulfurization solvent in natural gas and syngas processes. Its stability and low volatility make it ideal for long-cycle extraction and gas purification systems.

Other Industrial Applications

• NMP finds additional uses in surfactant production, metal cleaning, lubricant refining, and membrane manufacturing. It enhances surface activity in emulsifier formulations and serves as a dispersant in wax emulsions. In metalworking, it acts as a degreasing and stripping agent, providing high efficiency with minimal corrosion. It is also used in membrane materials such as reverse osmosis and ultrafiltration systems, offering consistent porosity and film strength.

Storage & Handling

• Store in sealed containers under dry, ventilated conditions.
• Avoid exposure to heat, sparks, and sunlight.
• Keep away from strong oxidizing agents and acids.
• Handle using dry and clean equipment.
• Apply nitrogen blanket for high-purity electronic material handling.

Usage Notice

• Use gloves, goggles, and protective clothing during operation.
• Prevent prolonged skin or inhalation exposure.
• Ensure adequate ventilation in working areas.
• Follow local environmental regulations for waste disposal.
• Cathode slurry formulation: LiCoO₂ 93.5%, Super P 3%, PVDF 2.5%, NMP balance — ensures uniform dispersion and strong electrode adhesion.
• High-solid cathode slurry: Active material 100 g, CNT 0.83 g, PVDF 0.8 g, NMP 8.08 g — improves energy density and drying efficiency.
• Photoresist stripping solution: NMP 60%, DMSO 20%, DI water 15%, inhibitors 5% — effectively removes resist residues.
• PCB cleaning formulation: Diacetone alcohol 120 parts, NMP 24 parts, nonionic surfactant 4 parts — removes flux and surface contaminants.
• Waterborne coating: Resin blend + pigment + additives + NMP 6% — enhances film formation and leveling properties.
• UV ink composition: Epoxy acrylate 70%, diluent 15%, photoinitiators 7%, NMP as co-solvent — optimizes flow and adhesion.
• Peptide synthesis medium: Amino acid 1 mmol + DCC 1.2 mmol + HOBt 1.2 mmol + NMP 40 mL — provides efficient reaction environment.
• Herbicide synthesis: Raw materials + NMP 100 mL — yields 73% high-purity product.
• Wax emulsion agent: Paraffin + NMP 15–20% — forms stable acid- and alkali-resistant microemulsion.
• Gas purification system: NMP used as extractant for aromatics and desulfurization solvent — enhances efficiency and selectivity.

Packaging

• 200 kg plastic drum
• 200 kg iron drum
• Custom packaging available upon request